Oxalyl fluoride

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Oxalyl fluoride is a fluorinated derivative of oxalic acid. It is being investigated for use in etching as a replacement for compounds which have the liability of high global warming potential.^[1]^[2]

References

↑ Method of etching and cleaning using fluorinated carbonyl compounds, US Patent 6635185.
↑ Simon Karecki, Ritwik Chatterjee, Laura Pruette, Rafael Reif, Terry Sparks, Laurie Beu, Victor Vartanian, and Konstantin Novoselovc (2001). "Evaluation of Oxalyl Fluoride for a Dielectric Etch Application in an Inductively Coupled Plasma Etch Tool". J. Electrochem. Soc. 148 (3): G141–G149.

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[1] Method of etching and cleaning using fluorinated carbonyl compounds, US Patent 6635185.

[2] Simon Karecki, Ritwik Chatterjee, Laura Pruette, Rafael Reif, Terry Sparks, Laurie Beu, Victor Vartanian, and Konstantin Novoselovc (2001). "Evaluation of Oxalyl Fluoride for a Dielectric Etch Application in an Inductively Coupled Plasma Etch Tool". J. Electrochem. Soc. 148 (3): G141–G149.

[1]

[2]

Oxalyl fluoride

See also

References

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